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Volume & Issue no: Volume 3, Issue 6, June 2014

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Title:
Study of the Structural and Optical Properties of Titanium dioxide Thin Films Prepared by RF Magnetron sputtering
Author Name:
Aqeel K. Hadi, Muneer H.Jaduaa, Abdul- Hussain K. Elttayef
Abstract:
Abstract TiO2 thin films were deposited by reactive R.F. magnetron sputtering method on glass substrates with different thicknesses 100 and 200 nm. The structure of TiO2 thin films was tested with the X-Ray diffraction and it was formed to be a polycrystalline with recognized peaks oriented in ( 101) , ( 004) and ( 105) for thickness of 100 nm and (101), ( 004) ( 200) for thickness of 200 nm . The surface morphology of the deposits materials have been studied by using atomic force microscope (AFM). The grain size of the nanoparticles observed in the range of (27) (32) nm for the thickness of 100 and 200 nm respectively. The optical properties concerning the absorption and transmission spectra were studied for the prepared thin films. Optical band gaps were calculated and were found to be (3.35) eV and (3.05) eV for sample thickness of 100 and 200 nm respectively. Keywords: TiO2 : Thin Film; Nanostructure; Optical; Sputtering RF.
Cite this article:
Aqeel K. Hadi, Muneer H.Jaduaa, Abdul- Hussain K. Elttayef , " Study of the Structural and Optical Properties of Titanium dioxide Thin Films Prepared by RF Magnetron sputtering" , International Journal of Application or Innovation in Engineering & Management (IJAIEM) , Volume 3, Issue 6, June 2014 , pp. 095-099 , ISSN 2319 - 4847.
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